ARCNL welcomes new group leader Angana Mondal
ARCNL welcomes new group leader Angana Mondal |
With a strong background in laser-plasma physics and materials chemistry, Angana joins ARCNL to lead the new Short-Wavelength Light Sources for EUV Metrology research group. She and her group will explore the generation of light using liquids and novel materials, and how this can be applied to nanoscale imaging and metrology. |
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New research program to study wavelengths beyond extreme ultraviolet light |
This so-called “Beyond EUV” (BEUV) could push the limits of resolution in nanoscale printing, metrology and imaging. The new program at ARCNL is made possible by NWO-I’s Strategic Innovation Fund. |
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ARCNL research well represented at NWO Physics 2026 in Veldhoven |
The annual conference brought together the Dutch physics community in Veldhoven on January 20-21. ARCNL research was well represented, from parallel talks and posters to informal chats on the exhibition floor. |
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Five PhD candidates successfully defended their theses before the winter holidays, completing another row of covers on the Theses Wall. Congratulations to Dion Engels, Karl Schubert, Fengling Zhang, Falco Bijloo and Nick Feldman! |
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Shrinking the spotlight: super-resolution microscopy without labels |
Researchers in Peter Kraus's group have shown a way to overcome the diffraction limit in optical microscopy without fluorescent markers − a potential tool for both semiconductor manufacturing and clinical research. |
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Grant awarded for algorithmic nanoscale imaging collaboration |
The CHAIN project has been awarded an NWO Perspectief grant. Lyuba Amitonova and collaborators will develop new nanoscale imaging techniques to improve the computer chip manufacturing process. |
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Tiny salt crystals reduce friction and wear on silicon surfaces |
During his MSc project, ARCNL PhD candidate Tijn Vernooij discovered that calcium sulfate, a widely used material, could be used in the form of thin nanocrystals to reduce friction between silicon surfaces. |
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Emilia Olsson joins Deep Tech Day panel on translating research to impact |
The panel discussion centered around the role of deep tech in academia, as part of University of Amsterdam Faculty of Science’s Deep Tech Day on January 28. |
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This special symposium will commemorate the research contributions of Wim with various speakers from the past, present, and future. |
The 2nd “Plasma Zonheuvel” conference, short for “NNV Plasma Physics Symposium Zonheuvel”, is part of the renewed conference series that revives and unites the two former 2-day annual plasma physics meetings in The Netherlands: the series in Lunteren (NNV Section meeting) and the one in Rolduc (WELT-PP). |
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Science Park 106
1098 XG Amsterdam
The Netherlands |
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ARCNL is a public-private partnership between NWO, University of Amsterdam, Vrije Universiteit Amsterdam, University of Groningen and semiconductor equipment manufacturer ASML, and managed by the Netherlands Foundation of Scientific Research Institutes (NWO-I). ARCNL’s mission is to focus on fundamental physics and chemistry in the context of technologies for (nano)lithography, primarily for the semiconductor industry. |
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