Public-private partnerships in spotlight
Panel discussion and book launch highlight successful public-private partnerships |
On September 4, colleagues and collaborators from ARCNL gathered to discuss public-private partnerships and to launch a special book. In a panel discussion, distinguished leaders from academia and business reflected on public-private partnerships and 10 years of ARCNL. This was followed by the launch of the book “ASML and Dutch Physics – A History of the Advanced Research Center for Nanolithography (ARCNL) 2014–2024,” written by science historian Hein Brookhuis. |
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ARCNL helps redefine how we measure roughness in Surface-Topography Challenge |
Surface roughness measurements have long been described by a single number. Bart Weber and Cyrian Leriche at ARCNL joined the worldwide challenge to rethink this with the most thorough surface analysis to date. |
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How to vaporize a pancake: laser intensity key to tin vaporization |
Research on extreme ultraviolet light (EUV) sources is key to developing machines to make smaller computer chips. PhD student Dion Engels explores the process of vaporizing tin for its potential in EUV sources. |
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Behind the Research: New series highlights the people of ARCNL |
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Behind the Research: new series highlights the people of ARCNL |
In this series, we show you both ARCNL science and the people behind the research. Many thanks to postdoctoral researcher Mikheil Kharbedia for contributing to the first edition!
With this series, we want to give prospective PhD candidates and postdocs a sense of what it is like to work at ARCNL, by sharing experiences and insights from our researchers.
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All eyes on ARCNL research at European Optical Society Annual Meeting |
ARCNL research had a strong presence at this year’s European Optical Society Annual Meeting (EOSAM). Many of our researchers contributed to the conference, from plenary talks to poster awards and more. |
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Ronnie Hoekstra gives special keynote presentation at ICPEAC in Japan |
This was the first time in more than 25 years that a researcher from the Netherlands was a keynote speaker at the International Conference on Photonic, Electronic and Atomic Collisions (ICPEAC). |
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ARCNL opens its doors to everybody with an interest in science. Expect fun workshops, interesting lectures and fascinating demonstrations. |
Prof. Dr. Marcelo Ackermann will start this November as the director of ARCNL, the Advanced Research Center for Nanolithography in Amsterdam. He will succeed Dr. Wim van der Zande. |
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Science Park 106
1098 XG Amsterdam
The Netherlands |
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ARCNL is a public-private partnership between NWO, University of Amsterdam, Vrije Universiteit Amsterdam, University of Groningen and semiconductor equipment manufacturer ASML, and managed by the Netherlands Foundation of Scientific Research Institutes (NWO-I). ARCNL’s mission is to focus on fundamental physics and chemistry in the context of technologies for (nano)lithography, primarily for the semiconductor industry. |
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