Laser writing, many new PhDs and more..
Marcelo Ackermann appointed new director of ARCNL |
Marcel Ackermann will start this November, succeeding Wim van der Zande. With over 20 years of experience in academic and industrial research in applied physics and engineering, Ackermann is a natural fit for the role. |
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Visualizing the invisible: high-speed, label-free, high-resolution phase imaging |
Researchers have developed an exciting new phase imaging method, with applications in biomedicine, semiconductor inspection, and beyond. The research published in APL Photonics is highlighted as an Editor's Pick. |
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Experiments shed new light on the limits of laser-writing method |
Last year at ARCNL, Lorenzo Cruciani made a surprise discovery of a method to directly write patterns of ruthenium with a laser. A new Editor's-Pick research paper explores the properties and limitations. |
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Theses Wall celebrations: Congratulations to all the new Doctors! |
Six ARCNL researchers completed their PhDs in recent months. Congratulations to Dr. Jan Mathijssen, Dr. Stefan van Vliet, Dr. Lorenzo Cruciani, Dr. Thomas van den Hooven, Dr. Ester Abram and Dr. Tamar Cromwijk! |
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First Edition of the NNV Plasma Rolduc Conference organized by ARCNL and TU/e |
The conference, held on April 2-3, covered plasma physics research conducted in the Netherlands, Belgium, and Germany. Topics included extreme plasmas, plasma diagnostics and modeling, and plasma processing. |
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ARCNL Ion Interactions lab finds home in new Feringa Building in Groningen |
Named for Nobel Laureate Prof. Ben Feringa, the building’s grand opening on June 17 brought special guests to Ronnie Hoekstra's new lab, including Techleap Envoy Constantijn van Oranje and Ben Feringa himself. |
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ARCNL 10-year celebration with panel discussion and book launch. The event (in Dutch) will feature panel discussions and the book launch of "ASML and Dutch Physics - A history of the Advanced Research Center for Nanolithography (ARCNL) 2014-2024" by historian of science Hein Brookhuis. |
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Science Park 106
1098 XG Amsterdam
The Netherlands |
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ARCNL is a public-private partnership between NWO, University of Amsterdam, Vrije Universiteit Amsterdam, University of Groningen and semiconductor equipment manufacturer ASML, and managed by the Netherlands Foundation of Scientific Research Institutes (NWO-I). ARCNL’s mission is to focus on fundamental physics and chemistry in the context of technologies for (nano)lithography, primarily for the semiconductor industry. |
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